Joanneum Research MATERIALS
Inkjet
[Inkjet Printing](https://www.joanneum.at/en/materials/research-areas/additive-manufacturing-processing-and-printing/tintenstrahldruck) is a contactless and digital (maskless) industrialscalable printing technology. Thereby single droplets of low viscosity inks are ejected from nozzles located in the printing head. Each droplet ejection is triggered by a voltage driven piezo-element, literally squeezing out each droplet of the corresponding nozzle. Industrial inkjet printing heads contain up to 2048 nozzles, allowing for a high degree of parallelization and throughput. At the MATERIALS institute three state-of-the-art inkjet printers are available, a Dimatix DMP 2800 and two PIXDRO LP50 (one in the clean room) systems, allowing for the integration of different industrial printing heads.
Glovebox-Cluster
[Glovebox-Cluster including vapor deposition](https://www.joanneum.at/en/materials/infrastructure/cleanroom-class-6-certified-according-to-iso-14644/glovebox-cluste)
Photolithography
In the [photolithography](https://www.joanneum.at/en/materials/infrastructure/cleanroom-class-6-certified-according-to-iso-14644/fotolithografie) process, light is used to transfer a geometric pattern through a mask to a photosensitive resist on a substrate. This lithographic method is mainly used in the semiconductor fabrication. The main limitation of this method is the wavelength of the used light, which imposes the geometrical size of fabricated structures - hence only structures down to 1µm are possible.
Cleanroom (Particle measurement)
[Cleanliness leve](https://www.joanneum.at/en/materials/infrastructure/cleanroom-class-6-certified-according-to-iso-14644)l: max. 35,200 particles per cubic meter, size ≥ 0.5 µm; max. 8,320 particles per cubic meter, size ≥ 1 µm; max. 293 particles per cubic meter, size ≥ 5 µm.Air exchange: 12 times room volume / h Air recirculation through FFUs: 40 – 60 times room volume / h Temperature winter/summer: 21/24 ± 2 °C Relative humidity: 45 ± 10
NIL
In [nanoimprint lithography](https://www.joanneum.at/en/materials/infrastructure/cleanroom-class-6-certified-according-to-iso-14644/nanoimprint-lithografie) a geometric pattern is created by the mechanical deformation of the imprint resist. That means, a patterned stamp is pressed into the liquid resin and the resin is then hardened either by UV light or heat. Hence, the nanoimprint lithography is an advanced method for creating patterns down to the nanometer range at a low cost.
RIE
A further process for the fabrication of topographic structures used in micro- and nanotechnology is [reactive ion etching (RIE)](https://www.joanneum.at/en/materials/infrastructure/cleanroom-class-6-certified-according-to-iso-14644/reaktives-ionenaetzen-rie-o2/ar/n2/sf6/cfu). It is an ion-assisted reactive etching process with excellent etching behavior in terms of homogeneity, etch rate, etch profile and selectivity.
E-line (E-beam-litho)
[Electron beam lithography (EBL)](https://www.joanneum.at/en/materials/infrastructure/cleanroom-class-6-certified-according-to-iso-14644/elektronenmikroskop) is a method for creating ultra-fine, nanometer-sized structures in modern nanotechnology. It is an important instrument in semiconductor technology, used to produce photomasks for photolithography, or stamps for other lithographic processes.
